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The main focus of this tutorial is the accurate modeling of macroscopic gas flow, heat and mass transfer, species diffusion, and chemical reactions (including surface reactions) in a rotating disk CVD reactor. In this tutorial, you learned how to use the two-step surface reactions involving site species, and computed simultaneous deposition of gallium and arsenide from a mixture of precursor gases on a rotating susceptor. Note that the same approach is valid if you are simulating multi-step reactions with multiple sites/site species.